Photomask is a photographic pattern, used to make microcircuit and ultraviolet light. These lights are shined through the mask on to a photoresist to transfer the pattern. These photomasks are used to manufacture components for instance display devices, micro-electromechanical system (MEMS), discrete semiconductor components, and standalone printed circuit board (PCB). In addition, the photomask has numerous applications, some of them are used to support consumers’ microlithography process as a midway step between production of photonics, ICs, and MEMS devices. The photomasks are extensively used to develop devices for computer & peripherals, automotive product, military product, consumer product, and biomedical & medical products. Moreover, photomask encompasses the pattern of integrated circuits, and they have become smaller & more complex to accurately transfer the pattern to silicon wafer.
According to study, “Photomask Market by Product (Reticle, Master Mask, and Others), Mask Shop Type (Captive Mask and Merchant Mask) and Application (Optical Devices, Discrete Components, Displays, MEMS, and Others): Global Opportunity Analysis and Industry Forecast, 2019-2026”. Some of the key companies operating in the global photomask market are Applied Materials, Inc., Advanced Reproductions Corporation, SK-Electronics Co. Ltd., Photronics Inc., Infinite Graphics Incorporated, Taiwan Mask Corporation (TMC), LG Innotek, Compugraphics Photomask Solutions, HTA Photomask, Nippon Filcon Co. Ltd., and Hoya Corporation. Key vendors are anticipated to witness substantial challenges to their growth owing to the rapid technological advances and cyclical nature of the semiconductor industry.
Based on type, photomask market is segmented into working mask, copy mask, reticle and master mask. Based on equipment, market is segmented into inspection equipment and photomasking equipment. Photomasking segment is estimated to exhibit considerable growth rate due to large-scale production & sales of wireless computing and communication devices during the forecast period. Based on mask shop type, market is segmented into merchant and captive. Based on application, market is segmented into discrete, display devices, optoelectronics, semiconductor & IC and others. In addition, based on end-user, market is segmented into electronics & semiconductors, research & development, chemical etching manufacturing, healthcare & pharma, automotive, aerospace, microfluidics, and others.
The photomask market is driven by increase in usage of automated systems across various industry verticals, followed by rise in demand for high density chip, growth in adoption of consumer electronic products and rise in demand of the semiconductors. However, high product cost and complexity related to photomask manufacturing process may impact the market. Moreover, increase in focus towards advancements in technologies such as Internet-of-Things (IoT) is a key opportunity for market.
Based on geography, the Asian-Pacific is a leading region in global photomask market owing to increase in adaptation of advanced photomasks in semiconductor & electronics industry in the region. Whereas, the North-Americana and European regions are expected to exhibit substantial growth rate due to growth in development of chips with high circuit density over the forecast period. In upcoming years, it is anticipated that future of the market will be optimistic because of growth in automation in semiconductor & electronics industry along with increase in technological advancements in semiconductor industry during the forecast period.
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